Dedicated to Computer-Generated Optics
Parallel-write
photoplotter
Full Photolithographic facilities
Spin coaters
Splutter
Ovens
Hotplates
MJB3 mask aligner
Mask Making Facilities
High-speed Mivatec 1648 photoplotter
David Mann and CGA photorepeaters
Direct-write into photoresist
High-speed plotting of continuous
relief structures in photoresist with a parallel-write
(1,470,000 pixels per shot) photoplotter
Device Characterization
Interferometric profiling microscope
Mach-Zehnder Microscope
Inspection Microscopes
|
Technical Features |
|
| Materials |
Photo-resist or Sol-Gel on Glass or Fused Silica |
| Wavelengths |
Down to 350nm Up to 2000nm (2*PI dephasing) |
| Address Grid | Down to 300nm |
| Feature size | Down to 2 microns |
| Substrate size | Up to 4x4 inches |
| Phase levels |
Binary Multi-level relief (16+ levels) |
| Mode of Operation |
Transmission Reflection (gold coated) |